Lace raises $40M to replace chip-making light with helium atoms

"Lace Lithography uses a beam of helium atoms rather than light to etch chip patterns, achieving a width of approximately 0.1 nanometres, which is about 135 times finer than ASML's EUV light."

"The practical implication of Lace's technology is the potential to create chip features up to ten times smaller than what current lithography allows, reaching what Holst describes as 'ultimately atomic resolution.'"

"The $40 million Series A funding round was led by Atomico, with participation from Microsoft's venture arm M12, Linse Capital, and other investors, indicating strong interest in Lace's innovative approach."

Lace Lithography, founded by physicist Bodil Holst, utilizes a helium atom beam to etch chip features significantly smaller than those produced by existing extreme ultraviolet lithography. The startup is raising $40 million to develop this technology, which could enable chip features up to ten times smaller than current capabilities. The Series A funding was led by Atomico, with participation from Microsoft’s M12 and others. Lace aims to have a test tool ready for a pilot chip fabrication plant by 2029, with prototypes already developed.

Read at TNW | Startups-Technology